Plasma nitriding furnace - ASPN

Energy Efficiency and Environmentally Friendly Technology

ALD France is the exclusive owner of the ION₂-cloud® patent which enables us to manufacture plasma nitriding furnace with the active screen technology.
The ASPN furnace is also compliant with DCPN technology
It can be customized to production requirements.
It complies with CE and UL.

Our plasma nitriding furnaces can be used for:

• Plasma etching
• Plasma nitriding
• Plasma nitrocarburizing
• Plasma oxidation

Cold wall design:

• Temperature up to 700°C
• Accurate temperature homogeneity (+/-5°C)
• Fine vacuum 10^-2 mbar
• Easy HMI with touchscreen technology
  
• Low amount of gas used and hazard emission
• Mixed loads and highly dense loads
• Fully automatic process control
• Excellent process repeatability

Options:

• Accelerated cooling system
• Double base
• Nadcap compliance
• Gas: CH₄, CO₂, O₂, and more

 Further options upon request.